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- W2079756171 abstract "ZnO:Al films were produced by dual-target reactive magnetron sputtering. The effects of different deposition conditions were investigated. Under optimized conditions, 0.3-pm-thick films had -1% luminous absorptance, ≈85 % thermal infrared reflectance, and a dc resistivity of ≈5 x 10<sup>-4</sup> Ω cm. Rutherford Backscattering Spectrometry showed that the Al content was ≈2 at.%. Transmission electron microscopy showed that the crystallite size was ≈50 nm for films deposited onto unheated substrates." @default.
- W2079756171 created "2016-06-24" @default.
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- W2079756171 date "1987-11-12" @default.
- W2079756171 modified "2023-09-23" @default.
- W2079756171 title "Transparent And Heat-Reflecting ZnO:Al Films: Preparation And Optical Properties" @default.
- W2079756171 doi "https://doi.org/10.1117/12.941865" @default.
- W2079756171 hasPublicationYear "1987" @default.
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