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• W2079778322 abstract "The possibility of using sputtered metals as mask materials for deep anisotropic chemical etching in silicon was investigated. Sputtered films of chrome, nickel and tungsten were all found to be chemically resistant to potassium hydroxide (KOH) and tetramethyl ammonium hydroxide (TMAOH). However as expected, these metals had poor adhesion to the silicon substrate. By comparison sputtered titanium was found to have excellent adhesion properties, and was chemically resistant to TMAOH but not to KOH. Resistance to KOH was achieved by thermal oxidation of the titanium film, at temperatures between 600 and 900° C. Following oxidation, etch depths more than 200μm were readily achieved in KOH etching. This makes sputtered titanium a potential alternative to the conventional mask material, silicon nitride, for the application of deep anisotropic etching. The reduction in etch rates due to a galvanic effect of conductive metal masks on silicon-on-insulator wafers was also investigated. It was observed that this effect was also overcome by thermal oxidation of the titanium mask." @default.
• W2079778322 created "2016-06-24" @default.
• W2079778322 creator A5029209423 @default.
• W2079778322 creator A5043941117 @default.
• W2079778322 creator A5067290922 @default.
• W2079778322 date "2004-04-02" @default.
• W2079778322 modified "2023-09-23" @default.
• W2079778322 title "The use of titanium and titanium dioxide as masks for deep silicon etching" @default.
• W2079778322 cites W1670172520 @default.
• W2079778322 cites W1983865519 @default.
• W2079778322 cites W1986252415 @default.
• W2079778322 cites W1989843607 @default.
• W2079778322 cites W1997907625 @default.
• W2079778322 cites W2000270739 @default.
• W2079778322 cites W2000528198 @default.
• W2079778322 cites W2007738312 @default.
• W2079778322 cites W2011804168 @default.
• W2079778322 cites W2013024039 @default.
• W2079778322 cites W2027643306 @default.
• W2079778322 cites W2032691994 @default.
• W2079778322 cites W2037324632 @default.
• W2079778322 cites W2038766008 @default.
• W2079778322 cites W2065307024 @default.
• W2079778322 cites W2088357735 @default.
• W2079778322 cites W2094368312 @default.
• W2079778322 cites W2097805013 @default.
• W2079778322 cites W2107883583 @default.
• W2079778322 cites W2116450734 @default.
• W2079778322 cites W2118882100 @default.
• W2079778322 cites W2147142329 @default.
• W2079778322 cites W2167485075 @default.
• W2079778322 cites W2181267493 @default.
• W2079778322 cites W2888782157 @default.
• W2079778322 cites W3110633032 @default.
• W2079778322 cites W2984141929 @default.
• W2079778322 doi "https://doi.org/10.1117/12.522845" @default.
• W2079778322 hasPublicationYear "2004" @default.
• W2079778322 type Work @default.
• W2079778322 sameAs 2079778322 @default.
• W2079778322 citedByCount "2" @default.
• W2079778322 crossrefType "proceedings-article" @default.
• W2079778322 hasAuthorship W2079778322A5029209423 @default.
• W2079778322 hasAuthorship W2079778322A5043941117 @default.
• W2079778322 hasAuthorship W2079778322A5067290922 @default.
• W2079778322 hasBestOaLocation W20797783222 @default.
• W2079778322 hasConcept C100460472 @default.
• W2079778322 hasConcept C111368507 @default.
• W2079778322 hasConcept C127313418 @default.
• W2079778322 hasConcept C127413603 @default.
• W2079778322 hasConcept C130472188 @default.
• W2079778322 hasConcept C159985019 @default.
• W2079778322 hasConcept C160671074 @default.
• W2079778322 hasConcept C171250308 @default.
• W2079778322 hasConcept C179104552 @default.
• W2079778322 hasConcept C185592680 @default.
• W2079778322 hasConcept C19067145 @default.
• W2079778322 hasConcept C191897082 @default.
• W2079778322 hasConcept C192562407 @default.
• W2079778322 hasConcept C22423302 @default.
• W2079778322 hasConcept C2777289219 @default.
• W2079778322 hasConcept C2777879272 @default.
• W2079778322 hasConcept C2779227376 @default.
• W2079778322 hasConcept C2779281663 @default.
• W2079778322 hasConcept C2779439175 @default.
• W2079778322 hasConcept C33220542 @default.
• W2079778322 hasConcept C42360764 @default.
• W2079778322 hasConcept C506065880 @default.
• W2079778322 hasConcept C544956773 @default.
• W2079778322 hasConceptScore W2079778322C100460472 @default.
• W2079778322 hasConceptScore W2079778322C111368507 @default.
• W2079778322 hasConceptScore W2079778322C127313418 @default.
• W2079778322 hasConceptScore W2079778322C127413603 @default.
• W2079778322 hasConceptScore W2079778322C130472188 @default.
• W2079778322 hasConceptScore W2079778322C159985019 @default.
• W2079778322 hasConceptScore W2079778322C160671074 @default.
• W2079778322 hasConceptScore W2079778322C171250308 @default.
• W2079778322 hasConceptScore W2079778322C179104552 @default.
• W2079778322 hasConceptScore W2079778322C185592680 @default.
• W2079778322 hasConceptScore W2079778322C19067145 @default.
• W2079778322 hasConceptScore W2079778322C191897082 @default.
• W2079778322 hasConceptScore W2079778322C192562407 @default.
• W2079778322 hasConceptScore W2079778322C22423302 @default.
• W2079778322 hasConceptScore W2079778322C2777289219 @default.
• W2079778322 hasConceptScore W2079778322C2777879272 @default.
• W2079778322 hasConceptScore W2079778322C2779227376 @default.
• W2079778322 hasConceptScore W2079778322C2779281663 @default.
• W2079778322 hasConceptScore W2079778322C2779439175 @default.
• W2079778322 hasConceptScore W2079778322C33220542 @default.
• W2079778322 hasConceptScore W2079778322C42360764 @default.
• W2079778322 hasConceptScore W2079778322C506065880 @default.
• W2079778322 hasConceptScore W2079778322C544956773 @default.
• W2079778322 hasLocation W20797783221 @default.
• W2079778322 hasLocation W20797783222 @default.
• W2079778322 hasOpenAccess W2079778322 @default.
• W2079778322 hasPrimaryLocation W20797783221 @default.
• W2079778322 hasRelatedWork W1968581245 @default.
• W2079778322 hasRelatedWork W1980475310 @default.
• W2079778322 hasRelatedWork W2039034544 @default.
• W2079778322 hasRelatedWork W2064807885 @default.
• W2079778322 hasRelatedWork W2079778322 @default.

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