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- W2079789920 abstract "Oxidation characteristics of fine‐grained (30–50 nm) Pb‐alloy film formed by the codeposition of Pb, In, and Au onto a liquid‐nitrogen‐cooled substrate (∼90 K) were studied in comparison with conventional film of 200 nm grain size formed by the sequential deposition of Au, Pb, and In at room temperature. The oxidized films were examined by Auger electron spectroscopy as well as x‐ray photoelectron spectroscopy and ellipsometry, and the normal tunneling resistance of Josephson junctions fabricated using the above films as base electrodes was measured. The thermal oxides formed on the fine‐grained and conventional films are identical. Rf‐plasma oxidation with these thermal oxides also present results in oxides of identical structure and thickness. In the absence of the thermal oxides, rf‐plasma oxidation of the fine‐grained film leads to In‐rich oxides of smaller thickness compared to the conventional films. It seems reasonable to attribute these results to the difference in grain sizes, i.e., the smaller‐grained films offer the In more available paths to diffuse through the alloy film. When the thermal oxides are present, rf‐plasma oxidation rate is reduced such that the difference in the diffusion rate of In through the alloy film is not evident and identical oxide structure and thickness are obtained." @default.
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- W2079789920 date "1986-11-01" @default.
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- W2079789920 title "Radio frequency‐plasma oxidation of fine‐grained Pb‐alloy films formed by codeposition at 90 K" @default.
- W2079789920 doi "https://doi.org/10.1116/1.573718" @default.
- W2079789920 hasPublicationYear "1986" @default.
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