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- W2079803497 abstract "Photoelectron and high resolution Auger spectroscopy indicate that multilayers of K deposited on Si(100)2×1 promote the oxidation of Si under subsequent exposure to O2. The oxygen uptake is enhanced by four orders of magnitude. The alkali can be completely desorbed from the surface at 900 K leaving behind a layer of SiO2, whose thickness is proportional to the amount of K deposited. The process can be further repeated. We propose a mechanism for this promoted oxidation supported by spectroscopic evidence." @default.
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- W2079803497 date "1987-10-01" @default.
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- W2079803497 title "Alkali-induced oxidation of silicon" @default.
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- W2079803497 doi "https://doi.org/10.1016/s0039-6028(87)80439-9" @default.
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