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- W2080068571 abstract "Long used as a replacement for COP in making 1:1 photomasks, poly(glycidyl methacrylate- co-3-chlorostyrene) (GMC), a negative acting e-beam sensitive resist, has recently been under investigation for additional applications, such as tight tolerance CD masks and 5X reticles. The process for GMC is straightforward and resilient within a manufacturing operation. In addition, the required process dose of 2.5 (mu) C/c2 does not affect exposure time in a limiting way. This study has demonstrated CD uniformity less than 30 nm 3-sigma and showing no CD deviation from 50% - 150% of nominal develop time. GMC shows linear CD growth with over-exposure in the range from 80% to 200% of nominal, with X vs. Y CD tuning accomplished by the use of MEBES auto-tap blanker setting. Preliminary defect results are presented and conclusions are drawn that consider GMC as an easy to use alternative for critical CD layers.© (1995) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only." @default.
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- W2080068571 date "1995-10-06" @default.
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- W2080068571 title "<title>Investigation of GMC for CD uniformity benefits</title>" @default.
- W2080068571 doi "https://doi.org/10.1117/12.228161" @default.
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