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- W2080080028 abstract "Electron diffraction experiments performed in an electron microscope on amorphous Ge films, which allowed to determine the elastically scattered intensity for s = 2 sin θ/λ between 0.1 and 3 Å−1, are described. The method of elimination of the inelastically scattered intensity, as well as the correction for experimental errors using the properties of the statistical distribution function, are exposed in detail. The interference functions and the statistical and radial distribution functions obtained for different samples are compared to those obtained by various authors from electron or X-ray diffraction. Nous décrivons des expériences de diffraction d'électrons par des couches minces de Ge amorphe réalisées dans un microscope électronique et permettant de mesurer l'intensité diffusée élastiquement pour des valeurs de s = 2 sin θ/λ comprises entre 0,1 et 3 Å−1. La méthode d'élimination de la diffusion inélastique que nous avons mise au point, ainsi que la correction des erreurs expérimentales à partir des propriétés de la fonction de répartition statistique, sont exposées en détail. Nous comparons les fonctions d'intcrférences, de répartition statistique et de distribution radiale obtenues pour différents échantillons à celles obtenues par divers auteurs à partir de diffraction de rayons X ou d'électrons." @default.
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- W2080080028 date "1973-08-01" @default.
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- W2080080028 title "Structure Studies by Electron Diffraction on Amorphous Ge Films" @default.
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- W2080080028 doi "https://doi.org/10.1002/pssb.2220580221" @default.
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