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- W2080363539 abstract "Several optical resists based on diazonaphthoquinone(DNQ)/novolac chemistry were evaluated for maskmaking application in the 130 nm device generation. Initial screening was performed at 10 kV with additional optimization at 50 kV. To enhance the electron-beam sensitivity, stronger metal ion developers were used. A Shipley i-line resist, SPR700, in conjunction with an optimized process, was found to demonstrate a bulk sensitivity of ≤ 20 μC/cm2 with a contrast of ≥ 5 at 50 kV. A design of experiment based on three development parameters was used to optimize the lithographic performance. A minimum feature size of 175 nm was resolved with very little corner rounding. This resist demonstrates strong attributes for use in mask technology for the 130 nm device generation." @default.
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- W2080363539 date "1998-03-01" @default.
- W2080363539 modified "2023-09-25" @default.
- W2080363539 title "Evaluation of DNQ/novolac resists for 130 nm device maskmaking" @default.
- W2080363539 cites W2044653519 @default.
- W2080363539 doi "https://doi.org/10.1016/s0167-9317(98)00072-0" @default.
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