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- W2080449498 abstract "Multi-photon absorption phenomena induced by ultra fast laser have been considered for many applications of microfabrications such as metal ablation, glass etching and photopolymerization. Among the applications, the photopolymerization by two-photon absorption (TPA) has been regarded as a new microfabricating method. It is possible to be used in photo mask correcting, diffractive optical element and micro machining. The TPA photopolymerization is made possible to fabricate a complicated three dimensional structure which the conventional photomask technology has not been able to make. Furthermore the TPA photopolymerization process applied to a two dimensional structure fabrication may take shorter time than the old process since the absence of etching and deposition processes. Recently we have made a simple 3D structure and applied the technique to PDMS(poly-dimethyl siloxane) molding." @default.
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- W2080449498 date "2004-12-30" @default.
- W2080449498 modified "2023-10-18" @default.
- W2080449498 title "Fabrication of PDMS (poly-dimethyl siloxane) molding and 3D structure by two-photon absorption induced by an ultrafast laser" @default.
- W2080449498 doi "https://doi.org/10.1117/12.576633" @default.
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