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- W2080458613 abstract "A new class of positive deep ultravoilet (UV) resists consisting of poly(p-disilanylenephenylene)s was developed, in which a disilanylene unit and a phenylene unit are connected alternatively in the polymer main chain. These resists had very high etching resistance against oxygen plasma. The lithographic applications of a double-layer resist system in which the poly(p-disilanylenephenylene) film was used as the top imaging layer were examined. As a result, very high resolution and high contrast were attained. The double-layer resist technique using organosilicon deep UV positive resist appears very promising for lithographic applications." @default.
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- W2080458613 date "1987-11-20" @default.
- W2080458613 modified "2023-10-14" @default.
- W2080458613 title "Organosilicon deep UV positive resist consisting of poly(p-disilanylenephenylene)" @default.
- W2080458613 doi "https://doi.org/10.1002/app.1987.070340709" @default.
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