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- W2080458632 abstract "We report the photoluminescence study of low-energy, low-dose oxygen implantation induced compositional disordering of AlGaAs/GaAs quantum well structures. Significant disordering of both single and multiple AlGaAs/GaAs quantum wells has been achieved using low-energy (155 keV) oxygen ion implantation with doses as small as 5 × 1013 cm−2 after a moderate annealing step. These doses are significantly lower than those reported previously (500 keV and 1016 cm−2)." @default.
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- W2080458632 date "1992-06-01" @default.
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- W2080458632 title "Disordering of AlGaAs/GaAs quantum well structures using low dose oxygen implantation" @default.
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- W2080458632 doi "https://doi.org/10.1063/1.350508" @default.
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