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- W2080467008 abstract "Nano-scale AFM lithography using the space area between the resist patterns of a negative-type resist was developed. A 15-nm-wide space line pattern could be fabricated on a 50-nm-thick resist film. Using this method, we fabricated a 25-nm-wide Ni line pattern." @default.
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- W2080467008 date "1999-01-01" @default.
- W2080467008 modified "2023-09-28" @default.
- W2080467008 title "Nano-scale Fabrication by AFM Lithography Using a Constant-current-control Exposure System." @default.
- W2080467008 doi "https://doi.org/10.2494/photopolymer.12.373" @default.
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