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- W2080470708 abstract "Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation Tomoyasu Inoue, Naomichi Sakamoto, Masayuki Ohashi, Shigenari Shida, Akihiro Horikawa, Yoshiyuki Sampei; Orientation selective epitaxial growth of CeO2(100) and CeO2(110) layers on Si(100) substrates. Journal of Vacuum Science & Technology A 1 January 2004; 22 (1): 46–48. https://doi.org/10.1116/1.1626644 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology A Search Advanced Search |Citation Search" @default.
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- W2080470708 title "Orientation selective epitaxial growth of CeO2(100) and CeO2(110) layers on Si(100) substrates" @default.
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