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- W2080500079 abstract "Abstract The oxidation process of a ternary AlMgSi alloy is studied by soft X-ray emission spectroscopy. In comparison to the binary AlMg alloy, the Si-containing sample has a much lower oxidation rate during heat treatment in air. The interface structure of the oxidized layer is mapped and the possible build-up mechanism is discussed." @default.
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- W2080500079 date "1993-05-01" @default.
- W2080500079 modified "2023-09-23" @default.
- W2080500079 title "Surface oxidation of dilute AlMgSi alloys" @default.
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