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- W2080610759 abstract "In the previous paper [Jpn. J. Appl. Phys. 32 (1993) L856], vacancy and silicon self-interstitial thermal equilibrium concentrations, i.e., C V 0 = 2.1×10 17 cm -3 and C I 0 = 3.4×10 16 cm -3 , were determined at 1100°C from an analysis of experimental data of P and Sb diffusions in silicon during thermal oxidation. From the relationship between these values and the Boltzmann factor, C V 0 and C I 0 are obtained as functions of the absolute temperature, T . Vacancy and self-interstitial diffusivities, D V and D I , are also given as functions of T by using the equation of D V C V 0 or D I C I 0 derived from Au diffusion experiments in silicon. Furthermore, the silicon self-diffusion mechanism is discussed and a successful model on the swirl defect formation mechanism is also proposed, using the obtained C V 0 , C I 0 , D V and D I . Consequently, C I 0 < C V 0 and D V < D I relations hold for arbitrary T . That is, the dominant thermal equilibrium defects in silicon are vacancies. It was also found that self-diffusion is mainly governed by the interstitialcy or vacancy mechanism for T >1158 K or T ≤1158 K." @default.
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- W2080610759 title "Point and Swirl Defects in Silicon" @default.
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