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- W2080641110 abstract "At a high temperature of about 1500 K, the migration of a Si microcluster was observed on a Si(001) surface by using an electron microscope. This cluster always existed together with an attendant region. This region melted first during heating because of its lower crystallinity compared to the Si substrate. The Si atoms in this melted zone were struck by electrons moving towards the anode and were pushed by the electron wind in the same direction as the electrons. The Si microcluster floating in the melted zone also migrated toward the anode side about ten times as fast as the Si electromigration atoms moving in the opposite direction." @default.
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- W2080641110 date "1996-03-11" @default.
- W2080641110 modified "2023-09-24" @default.
- W2080641110 title "Migration of a Si microcluster due to the electron wind on a Si(001) surface" @default.
- W2080641110 doi "https://doi.org/10.1063/1.116265" @default.
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