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- W2080663436 abstract "Room-temperature selective Si growth is possible by irradiating an electron beam on a Si surface in a Si2H6 ambient. The growth has an apparent substrate temperature dependence, such that the selective growth of Si is allowed at substrate temperatures only below 330 °C. We have found by the H2 thermal desorption experiments that the Si surface during the growth is covered with higher Si hydrides such as: SiH2, SiH3, and Si2H6 molecules. This indicates that the selective Si growth is caused by the higher Si hydrides. The reaction schemes of the Si growth are discussed in this article." @default.
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- W2080663436 date "1998-11-01" @default.
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- W2080663436 title "Kinetics of Si growth by an electron-beam-irradiation technique using a Si[sub 2]H[sub 6] source" @default.
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- W2080663436 doi "https://doi.org/10.1116/1.590304" @default.
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