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- W2080664090 abstract "Epitaxial potassium niobate thin films were deposited in situ by low pressure metalorganic chemical vapor deposition (MOCVD) at a growth temperature of 800 °C using niobium pentaethoxide and potassium tert‐butoxide as volatile metalorganic precursors. Growth on single crystal (100) lanthanum aluminate substrates produced [110]‐oriented potassium niobate films. The films have a smooth, featureless morphology. Atomic force microscopy of the MOCVD‐derived films surface indicates a root‐mean‐square roughness of less than 2 nm. Second‐harmonic generation of 1.064 μm incident light is observed from the potassium niobate thin films, and the effective second order nonlinear susceptibility d of the as‐deposited film is as high as 13 pm/V." @default.
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- W2080664090 date "1995-07-17" @default.
- W2080664090 modified "2023-09-23" @default.
- W2080664090 title "Epitaxial potassium niobate thin films prepared by metalorganic chemical vapor deposition" @default.
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- W2080664090 doi "https://doi.org/10.1063/1.114630" @default.
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