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• W2080702488 abstract "A detailed study of the stereochemistry of nucleophilic displacements at silicon by organometallics is reported for optically active systems containing both an intracyclic silicon atom and an intracyclic leaving group (1-naphtyl-2 phenyl-2 sila-2 oxa-1 cyclopentane and -hexane derivatives). The stereochemistry is always controlled by the electronic character of the nucleophile, but the strained geometry of a five-membered ring directs the stereochemistry towards inversion in borderline cases (allyllithium, LiAlH4/4 CuI, p-CH3OC6H4CH2Li). Analysis of the results and those reported previously for exocyclic leaving groups permits evaluation of the influence of angle strain on the stereochemistry at silicon. The gradual displacement of the stereochemistry as the angle strain at silicon is varied is explained in terms of a change of hybridization of the σ★ (SiX) orbital [1]." @default.
• W2080702488 created "2016-06-24" @default.
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• W2080702488 date "1980-08-01" @default.
• W2080702488 modified "2023-10-16" @default.
• W2080702488 title "Influence of angle strain on the stereochemistry of the nucleophilic displacements at silicon: Stereochemical behaviour of optically active systems containing both an intracyclic silicon atom and an intracyclic leaving group." @default.
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• W2080702488 doi "https://doi.org/10.1016/s0022-328x(00)93309-6" @default.
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