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• W2080808634 abstract "Chemical composition and some differences between surface and bulk structure of diamond-like carbon (DLC) thin films studied with Time-of-Flight Secondary Ion Mass Spectrometry (ToF SIMS) are the subject of this paper. The DLC films were deposited using radio-frequency plasma-chemical vapor deposition (RF PCVD) method by the decomposition of CH4 gas in high-frequency plasma. The negative self-bias voltage defining the power used for deposition was in the range of − 100 V to − 400 V. The results obtained show that the DLC films primarily contain carbon and hydrogen. The collected depth profiles also show that all samples contain considerable amount of Fe, Ni, Cr and some other elements introduced during the deposition process. These elements are mainly placed at the interface region of the substrate and deposited in the DLC film. The mass spectra obtained show that the amount of hydrogen in the surface layer is much greater than in the sample bulk which is consistent with widely accepted models of deposition of hydrogenated DLC films. The structure of the studied DLC samples was characterized by the analysis of negative carbon cluster ions in the mass spectra obtained. Some significant differences in the surface and bulk energy of fragmentation of carbon clusters are registered. The results suggest that the fragmentation pattern is independent of the self-bias voltage used during film deposition." @default.
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• W2080808634 date "2007-04-01" @default.
• W2080808634 modified "2023-10-16" @default.
• W2080808634 title "Application of Time-of-Flight Secondary Ion Mass Spectrometry to study diamond-like carbon films" @default.
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• W2080808634 doi "https://doi.org/10.1016/j.diamond.2006.11.038" @default.
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