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- W2080821497 abstract "A novolac resin suitable for the bottom planarizing layer in multilayer resist systems is discussed from the standpoint of exposure wavelength absorption. Absorption by the bottom planarizing layer is crucial to reduce the reflected light from the resist–substrate interface. It was clarified that the absorption of phenol novolac resin was higher than that of the cresol novolac resin under the same baking conditions. From infrared and nuclear magnetic resonance analysis, it was found that carbonyl structures were formed in the novolac resin after baking. In addition, cross-linking was found to occur at the methylene bridges in the phenol novolac resins. These factors seem to cause the absorption maxima to shift to a longer wavelength." @default.
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- W2080821497 date "1988-11-01" @default.
- W2080821497 modified "2023-10-03" @default.
- W2080821497 title "Absorption properties of the bottom novolac layer in multilayer resist systems" @default.
- W2080821497 doi "https://doi.org/10.1116/1.584164" @default.
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