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- W2080825036 abstract "Results of a study of proton implanted gallium arsenide (GaAs) waveguides are presented. The waveguides were made using standard implant equipment available to the microelectronics industry. Protons at energies of 190 Kev were implanted into heavily doped, n-type gallium arsenide. Implant doses were usually at 5E15 per cm2., with water used as the ion source. The implants were performed at room temperature, although some heating of the samples occurred. The main anneals were done at 350°C for 30 minutes. The waveguides were tested at 1.06μm using a YAG II laser. Loss measurements were done as a function of the substrate doping and etch pit density of the samples. Good guides were made using a doping of 3.5E18 cm<sup>-3</sup> and etch pit density of 35000 cm<sup>-2</sup>. Low etch pit densities did not yield acceptable guides using the above fabrication procedures." @default.
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- W2080825036 date "1988-03-10" @default.
- W2080825036 modified "2023-10-05" @default.
- W2080825036 title "Proton Implanted Gallium Arsenide Optical Waveguides" @default.
- W2080825036 doi "https://doi.org/10.1117/12.942330" @default.
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