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- W2080844584 abstract "The demand for large area and low cost nanopatterning techniques for optical coatings and photonic devices has increased at a tremendous rate. At present, it is clear that currently available nanopatterning technologies are unable to meet the required performance, fabrication-speed, or cost criteria for many applications requiring large area and low cost nanopatterning. Rolith Inc proposes to use a new nanolithography method - Rolling mask lithography - that combines the best features of photolithography, soft lithography and roll-to-plate printing technologies. We will report on the first results achieved on a recently built prototype tool and cylindrical mask, which was designed to pattern 300 mm wide substrate areas." @default.
- W2080844584 created "2016-06-24" @default.
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- W2080844584 date "2012-02-09" @default.
- W2080844584 modified "2023-09-26" @default.
- W2080844584 title "Rolling mask nanolithography: the pathway to large area and low cost nanofabrication" @default.
- W2080844584 doi "https://doi.org/10.1117/12.910158" @default.
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