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• W2080881467 endingPage "115001" @default.
• W2080881467 startingPage "115001" @default.
• W2080881467 abstract "We present a low-temperature (∼300 °C) process for preparing transparent conducting anatase Nb-doped TiO2 (TNO) polycrystalline films by sputtering. We first deposited amorphous films composed of an oxygen-rich bottom layer and oxygen-deficient top layer at room temperature. These films were then crystallized in a reducing atmosphere. The oxygen-rich bottom layer behaved as a seed layer during crystallization of the top layer, resulting in significant improvement of crystallinity and reduction of crystallization temperature. We obtained TNO polycrystalline films showing a resistivity of 6.4×10-4 Ω cm and absorption below 10% in the visible region by post-deposition annealing at 400 °C. The developed low-temperature process was applied to fabricating TNO films on plastics and glass with low glass-transition temperature." @default.
• W2080881467 created "2016-06-24" @default.
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• W2080881467 date "2008-10-24" @default.
• W2080881467 modified "2023-10-17" @default.
• W2080881467 title "Low-temperature Fabrication of Transparent Conducting Anatase Nb-doped TiO₂Films by Sputtering" @default.
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• W2080881467 doi "https://doi.org/10.1143/apex.1.115001" @default.
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