Matches in SemOpenAlex for { <https://semopenalex.org/work/W2080960023> ?p ?o ?g. }
Showing items 1 to 60 of
60
with 100 items per page.
- W2080960023 abstract "The methods of photomask cleaning used by the mask makers have been derived from the developments in the semiconductor industry. The understanding of the science of wafer cleaning has advanced significantly in the last decade. However, the past requirements for mask makers have not necessitated an in-depth study of the surface phenomena that dictate the mechanisms for particle adhesion and removal. A survey of the understanding developed in the wafer industry was conducted. Applications relevant to mask making have been identified. Based on this study, areas for future investigations in mask cleaning technology have been recommended." @default.
- W2080960023 created "2016-06-24" @default.
- W2080960023 creator A5015636922 @default.
- W2080960023 date "1994-12-07" @default.
- W2080960023 modified "2023-09-23" @default.
- W2080960023 title "<title>Photomask cleaning: areas for future focus</title>" @default.
- W2080960023 doi "https://doi.org/10.1117/12.195812" @default.
- W2080960023 hasPublicationYear "1994" @default.
- W2080960023 type Work @default.
- W2080960023 sameAs 2080960023 @default.
- W2080960023 citedByCount "0" @default.
- W2080960023 crossrefType "proceedings-article" @default.
- W2080960023 hasAuthorship W2080960023A5015636922 @default.
- W2080960023 hasConcept C117671659 @default.
- W2080960023 hasConcept C120665830 @default.
- W2080960023 hasConcept C121332964 @default.
- W2080960023 hasConcept C127413603 @default.
- W2080960023 hasConcept C14737013 @default.
- W2080960023 hasConcept C160671074 @default.
- W2080960023 hasConcept C171250308 @default.
- W2080960023 hasConcept C192209626 @default.
- W2080960023 hasConcept C192562407 @default.
- W2080960023 hasConcept C204223013 @default.
- W2080960023 hasConcept C2779227376 @default.
- W2080960023 hasConcept C2987888538 @default.
- W2080960023 hasConcept C41008148 @default.
- W2080960023 hasConcept C49040817 @default.
- W2080960023 hasConcept C53524968 @default.
- W2080960023 hasConceptScore W2080960023C117671659 @default.
- W2080960023 hasConceptScore W2080960023C120665830 @default.
- W2080960023 hasConceptScore W2080960023C121332964 @default.
- W2080960023 hasConceptScore W2080960023C127413603 @default.
- W2080960023 hasConceptScore W2080960023C14737013 @default.
- W2080960023 hasConceptScore W2080960023C160671074 @default.
- W2080960023 hasConceptScore W2080960023C171250308 @default.
- W2080960023 hasConceptScore W2080960023C192209626 @default.
- W2080960023 hasConceptScore W2080960023C192562407 @default.
- W2080960023 hasConceptScore W2080960023C204223013 @default.
- W2080960023 hasConceptScore W2080960023C2779227376 @default.
- W2080960023 hasConceptScore W2080960023C2987888538 @default.
- W2080960023 hasConceptScore W2080960023C41008148 @default.
- W2080960023 hasConceptScore W2080960023C49040817 @default.
- W2080960023 hasConceptScore W2080960023C53524968 @default.
- W2080960023 hasLocation W20809600231 @default.
- W2080960023 hasOpenAccess W2080960023 @default.
- W2080960023 hasPrimaryLocation W20809600231 @default.
- W2080960023 hasRelatedWork W1544888428 @default.
- W2080960023 hasRelatedWork W1712733447 @default.
- W2080960023 hasRelatedWork W1999414715 @default.
- W2080960023 hasRelatedWork W2023212528 @default.
- W2080960023 hasRelatedWork W2072698451 @default.
- W2080960023 hasRelatedWork W2079787243 @default.
- W2080960023 hasRelatedWork W2307858714 @default.
- W2080960023 hasRelatedWork W2899084033 @default.
- W2080960023 hasRelatedWork W3083094061 @default.
- W2080960023 hasRelatedWork W2752554233 @default.
- W2080960023 isParatext "false" @default.
- W2080960023 isRetracted "false" @default.
- W2080960023 magId "2080960023" @default.
- W2080960023 workType "article" @default.