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• W2081148424 startingPage "06GN04" @default.
• W2081148424 abstract "We have newly designed and fabricated single crystal silicon (SCS) disk-type micromechanical resonators with 150-nm-wide vertical transducer gaps. The transducer gaps have been fabricated through a simple process including a single trench etching of SCS by deep reactive ion etching (D-RIE) with a resist mask patterned by electron beam lithography. The peak resonant frequencies measured for the fabricated resonators agreed well with those predicted by finite element simulations. Furthermore, the D-RIE process conditions for transducer gaps have been improved. Using the improved D-RIE process conditions, less tapered gaps of 2 µm deep were successfully fabricated for 100-, 150-, and 200-nm-wide gap patterns. The sidewall angle was from 88 to 89° depending on the gap width." @default.
• W2081148424 created "2016-06-24" @default.
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• W2081148424 date "2010-06-01" @default.
• W2081148424 modified "2023-09-26" @default.
• W2081148424 title "Fabrication of 150-nm-Wide Transducer Gaps for Disk-Type Resonators by Single Dry Etching Process" @default.
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• W2081148424 doi "https://doi.org/10.1143/jjap.49.06gn04" @default.
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