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- W2081270794 abstract "It was reported that phases of Si(100)2 × n structures (6 < n < 10) were formed on a clean surface by quenching at temperatures higher than 800 ° C. These results were explained by ordered phases of missing-dimer defects. On the other hand, it was found by our experiment that the Si(100)2 × n structures were induced by Ni contamination. Appearance of the 2 × n structures and variation of n were closely correlated with the surface Ni concentration which depended on quenching temperature and cooling rate. In the present experiment, variations of the surface Ni concentration with heat treatments are measured by He + ion channeling spectroscopy. The quantitative surface concentrations of Ni impurity in the Si(100)2 × n structures are estimated and the striking change in the Ni surface concentration caused by quenching from different temperatures is discussed." @default.
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- W2081270794 date "1988-06-01" @default.
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- W2081270794 title "Structure analysis of Si(100)2 × n surfaces by ion channeling and blocking spectroscopy" @default.
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- W2081270794 doi "https://doi.org/10.1016/0168-583x(88)90642-8" @default.
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