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- W2081321423 abstract "This paper describes a simple and compact manual synchrotron radiation x-ray exposure system for fundamental research on ultrafine pattern fabrication with x-ray lithography. Special requirements for printing ultrafine patterns are investigated, and a step-and-repeat exposure system that includes a new gap-setting, a soft-contact mechanism in a vacuum, and a rough alignment mechanism is developed. All the mechanisms are neatly packed into a small vacuum chamber and are manually remote controlled. The system can be used for various fundamental studies. It is especially useful for experiments to print ultrafine patterns using x-ray cross-sectioned and phase-shifting masks. The success of a variety of experiments verifies the good performance and usefulness of this system." @default.
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- W2081321423 date "1995-12-01" @default.
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- W2081321423 title "A simple and compact synchrotron radiation x‐ray exposure system in a vacuum for ultrafine pattern fabrication" @default.
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- W2081321423 doi "https://doi.org/10.1063/1.1146520" @default.
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