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- W2081531457 abstract "A side-gated ultranarrow channel (width <10nm) silicon field effect transistor (FET) with extreme threshold voltage (Vt) tunability is described. A narrow inversion layer is formed on the top interface controlled by the top gate. The device body and side interfaces are accumulated by up to 1019cm−3 holes, drawn from the substrate by negatively biased side gates (Vside), increasing Vt by 3V, suppressing peripheral leakage currents and short channel effects. Vt response to Vside follows a square root behavior, dVt∕d−Vside=3.73V∕V, similar to that of body doping. Maximum linear tunability (dVt∕dVside) exceeds −2V∕V, average dVt∕dVside is −1.67V∕V." @default.
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- W2081531457 date "2007-12-10" @default.
- W2081531457 modified "2023-10-18" @default.
- W2081531457 title "Accumulated body ultranarrow channel silicon transistor with extreme threshold voltage tunability" @default.
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- W2081531457 doi "https://doi.org/10.1063/1.2818663" @default.
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