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- W2081652012 abstract "During the last years due to low-k<sub>1</sub> imaging , mid- and longrange flare as well as the necessity to quantify it , became more and more important for lithography optical systems. The so-called power spectral density (PSD) was proven to be an adequate means for describing rangedependent flare. At Carl Zeiss SMT AG a PSD metrology was concepted and sucessfully tested as one method for newest generation systems. We will give an outline into this aerial image based metrology and especially pay attention onto: 1. signal calibration as well as accurate focussing and lateral positioning 2. vignetting-free detection in face of large numerical apertures (near 1) 3. correlation with alternative flare metrics used in our house Both the necessity and the potential for extending the technique towards 193 nm immersion lithographic systems will be basically shown , too. The application of well-known models like the ABC and (as special case) the fractal PSD-model will be discussed for typical measurements. Limit cases and their physical meaning will be deduced for the fractal model." @default.
- W2081652012 created "2016-06-24" @default.
- W2081652012 creator A5034569280 @default.
- W2081652012 date "2005-06-16" @default.
- W2081652012 modified "2023-10-17" @default.
- W2081652012 title "Flare metrology used for PSD reconstruction" @default.
- W2081652012 doi "https://doi.org/10.1117/12.637297" @default.
- W2081652012 hasPublicationYear "2005" @default.
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