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- W2081661594 abstract "CrN coatings have been deposited successfully by Closed Filed Unbalanced Magnetron Sputter Ion Plating (CFUMSIP). The effect of substrate temperature (T S ) and bias voltage (V B ) together on microstructure, morphologies and mechanical properties of CrN coatings were studied. The results showed that the deposition rate of CrN coatings declines with the increase of V B Under both room temperature (R.M.) and 300°C. The FCC-CrN disappeared gradually and orth-CrN arised with the increase of V B , and the T S promoted the transformation from FCC - CrN to orth - CrN. The surface morphology of CrN coatings with changed V B s was greatly different, and V B could further improve the mechanical properties of coatings. In this paper, the CrN coating with the parameters (T S =300°C, V B =-30V) had relatively high deposition rate and mechanical properties." @default.
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- W2081661594 date "2013-11-01" @default.
- W2081661594 modified "2023-10-18" @default.
- W2081661594 title "Influence of Substrate Temperature and Bias Voltage on Structure and Mechanical Properties of CrN Coatings" @default.
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- W2081661594 doi "https://doi.org/10.4028/www.scientific.net/kem.591.99" @default.
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