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- W2081677866 abstract "The scaling down of device lateral dimensions imposes severe restrictions on the depth of shallow junctions and on the length of poly-Si runners. In this report an overview is given on the current understanding of the formation of self-aligned silicides, of defect generation and annihilation during silicidation, of silicidation of narrow lines and their thermal stability, and also on the recent evolutions in the formation of buried and surface epitaxially aligned CoSi2." @default.
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- W2081677866 date "1991-11-01" @default.
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- W2081677866 title "Materials aspects of silicides for advanced technologies" @default.
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- W2081677866 doi "https://doi.org/10.1016/0169-4332(91)90282-o" @default.
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