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• W2081696803 abstract "The feasibility of producing carbon nitride has been studied by ion implantation into amorphous carbon. Thin films were formed with 100 keV N+ or 80 keV C+ ions at various target temperatures and ion doses. The apparent surface hardness measured by nanoindentation with load-displacement data shows an optimum value of 22.3±0.4 GPa with the ion dose of 2×1017 N+/cm2 implanted at −100 °C, while the hardness of the unimplanted amorphous carbon is 6.0±0.2 GPa. Self-implantation by carbon also produces similar hardness enhancement with a narrow temperature window. The maximum enhanced surface hardness is well correlated with the asymmetric diffuse peak at around 1500 cm−1 in Raman spectroscopy." @default.
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• W2081696803 date "1996-08-01" @default.
• W2081696803 modified "2023-09-24" @default.
• W2081696803 title "Surface hardness enhancement in ion‐implanted amorphous carbon" @default.
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• W2081696803 doi "https://doi.org/10.1063/1.363017" @default.
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