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• W2081769475 abstract "Abstract The titanium hydrogen system is an ideal model for investigating the effect of poisoning processes on the kinetics of hydrogen absorption using the volumetric Wagener method. After a short initial reaction period, a hydride is formed on the film and the reaction rate then approaches a constant value which is decreased only if the sample surface is contaminated. Two types of experiments were performed in this study. In some experiments, films were exposed to hydrogen containing various concentrations of impurity gases and the poisoning reaction occurred parallel to hydride formation. In other experiments, film samples were exposed to hydrogen and to the impurity gas in several separate and subsequent steps within one run. These results of the two techniques are in good agreement and indicate that the mechanisms of the impurity reactions can be interpreted on the basis of the rate laws of oxidation or relevant surface contamination processes. Reaction models, recently developed for the simulation of the initial stage of metal oxidation, are used for a semiquantitative interpretation of the reaction mechanism responsible for the poisoning effects of oxygen." @default.
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• W2081769475 date "1991-08-01" @default.
• W2081769475 modified "2023-09-27" @default.
• W2081769475 title "Effect of O2, N2 and CO impurities on the H2 absorption rate of Ti films at 300 K" @default.
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• W2081769475 doi "https://doi.org/10.1016/0022-5088(91)90209-m" @default.
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