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- W2081937402 abstract "A 20 MeV electron linear accelerator designed by Nanjing University with irradiation dose 32 Mrad and different energies 8 MeV, 12 MeV, 16 MeV have been used to radiate the sample. The a-Si:H films were prepared by r.f. glow discharge decomposition of silane doped with phosphine at substrate temperature 250°C. The defects created by electron-irradiation have been investigated by lifetime spectrum of positron annihilation. The conductive activation energy E a , id est Fermi level of n-a-Si:H films was changed from 0.35 eV to 0.85 eV after irradiation. Meanwhile, the magnitude of electron drift mobility of n-a-Si:H films didn't find change at room temperature by traveling wave technique. These results can compare with that of light induced metastable effects in n-a-Si:H films." @default.
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- W2081937402 date "1985-12-01" @default.
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- W2081937402 title "The effect of electron radiation damage on transport properties of a-Si:H" @default.
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- W2081937402 doi "https://doi.org/10.1016/0022-3093(85)90704-5" @default.
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