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- W2081976475 abstract "ABSTRACT Absolute optical thickness is a fundamental parameter for the design of optical elements. In semiconductor industry, it is necessary to measure the absolute optical thickness of the central part of the projection lenses with a high accuracy. However, even when the geometrical thickness is perfectly known, a typical refractive index of fused-silica has an ambiguity of 6 x 10 -5 that gives an uncertainty of 180 nm in the optical thickness for a 3 mm-thick plate. Moreover, the optical thickness measured by white light interfe rometry and wavelength tuning interferometry is an optical thickness with respect to not the ordinary refrac tive index but the group refractive index. We measured the ordinary optical thickness of a fused silica plate of 6-inch square and 3 mm thickness by a wavelength tuning interferometer with a tunable phase shifting technique. We assumed the typical refractive index and dispersion of the fused silica as approximate values. The absolute interference order for the optical thickness was finally estimated, which gives a measurement resolutio n of typically 10 nm for the optical thickness. Keywords: Phase measurement, absolute optical path difference, wavelength scanning, optical thickness distribution measurement, phase shift, Fizeau interferometer" @default.
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- W2081976475 date "2011-08-15" @default.
- W2081976475 modified "2023-10-08" @default.
- W2081976475 title "Measurement of absolute optical thickness by wavelength tuning interferometer" @default.
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- W2081976475 doi "https://doi.org/10.1117/12.901637" @default.
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