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- W2082840897 abstract "Abstract Internal stress has been studied under concurrent ion bombardments during the deposition of boron thin films. Boron thin films prepared by the vacuum evaporation exhibited fairly large compressive stress of about 0.5 GPa even without ion irradiation. Hydrogen ion irradiation with 100–400 eV energy resulted in the large compressive stress of 0.8–1.2 GPa due to the ion peening effect. On the other hand, under the irradiation with 100–400 eV helium ion the stress relief was observed and the compressive stress decreased by a factor of about 2. This may be caused by the large sputtering (5–15%) that will modify film structure in the bulk and surface morphology, resulting in porous, rather dense film." @default.
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- W2082840897 date "1997-02-01" @default.
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- W2082840897 title "Effect of irradiation ion species on internal stress in boron thin films" @default.
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- W2082840897 doi "https://doi.org/10.1016/s0022-3115(97)80208-5" @default.
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