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- W2082968736 abstract "We describe a simple high-speed process for patterning metal silicides with an atomic force microscope (AFM). The process uses a thin AFM-generated oxide to block Pt diffusion during the formation of Pt silicide. Because the process requires only ∼1 nm of oxide, high write speeds and fine lateral resolution are achieved. We find that by maintaining ambient moisture at the tip–sample interface we can under optimal tip conditions achieve a minimum exposure time of ∼300 ns for a 30 nm size pixel which corresponds to a maximum write speed of ∼10 cm/s." @default.
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- W2082968736 date "1999-09-06" @default.
- W2082968736 modified "2023-09-26" @default.
- W2082968736 title "High speed patterning of a metal silicide using scanned probe lithography" @default.
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- W2082968736 doi "https://doi.org/10.1063/1.124730" @default.
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