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- W2082974227 abstract "Abstract Contrary to previously reported experimental results and theoretical estimates we find that there is no detectable diffusion of boron at typical deposition temperatures of glow-discharge amorphous silicon, i.e. D(285 °C) ⪅ 7 × 10 −20 cm 2 s −1 ." @default.
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- W2082974227 date "1988-08-01" @default.
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- W2082974227 title "On the diffusion of boron in glow-discharge a-Si:H" @default.
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- W2082974227 doi "https://doi.org/10.1016/0921-5107(88)90036-0" @default.
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