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• W2083127842 abstract "Polycrystalline Y 2 O 3 thin films have been prepared by radio frequency (RF) reactive sputtering. The topographies of Y 2 O 3 films were shown by AFM. The XPS measurement has found the interfacial silicates and the amorphous silicon sub-oxide (SiO x ) interfacial layer which is also indicated by the FTIR investigation. The interfacial reactions have been induced by an oxygen-deficient or oxygen-sufficient reaction environment at Y 2 O 3 /Si interface." @default.
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• W2083127842 date "2011-05-01" @default.
• W2083127842 modified "2023-09-27" @default.
• W2083127842 title "Effects of Oxygen-Deficient Ambience Annealing on Polycrystalline Y₂O₃ Film" @default.
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• W2083127842 doi "https://doi.org/10.4028/www.scientific.net/amr.233-235.2367" @default.
• W2083127842 hasPublicationYear "2011" @default.
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