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- W2083133711 abstract "A novel process of room temperature ion beam sputtering deposition of vanadium oxide films and low temperature post annealing for uncooled infrared detectors was proposed in this work. VO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>x</sub> thin films with relatively low square resistance (70 K Omega / square) and large temperature coefficient of resistance (more than 3%/K) at room temperature were fabricated using this low temperature process which was very compatible with the process of uncooled infrared detectors based on micromachined technology. Furthermore, chemical composition and film surface have been characterized using X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM) respectively. The results showed that the main composition of the processed thin films was V <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> O <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>5</sub> and the thin films were in the process of crystallization." @default.
- W2083133711 created "2016-06-24" @default.
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- W2083133711 date "2008-01-01" @default.
- W2083133711 modified "2023-09-26" @default.
- W2083133711 title "Low temperature deposited nano-structured vanadium oxide thin films for uncooled infrared detectors" @default.
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- W2083133711 doi "https://doi.org/10.1109/inec.2008.4585634" @default.
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