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- W2083148805 abstract "Magnetic, magnetoresistive and structural properties were studied for [Tb/Ti]n and [Tb/Si]n multilayers which were prepared by rf-sputtering. The thickness of the Tb layers varied from 1.5 to 12 nm. The thickness of 2 nm nonmagnetic spacers of Ti or Si was kept constant. Both anisotropic and isotropic magnetoresistance was observed in [Tb/Ti]n and [Tb/Si]n multilayers. A decrease in the thickness of the terbium layers led to a decrease in the anisotropic contribution to the total magnetoresistance. The negative isotropic magnetoresistanse in [Tb/Ti]n and [Tb/Si]n multilayers can be attributed to the giant magnetoresistance (GMR) and/or high field isotropic magnetoresistance. The structure of the samples of both types enabled the existence of the GMR effect." @default.
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- W2083148805 date "2011-01-15" @default.
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- W2083148805 title "Magnetoresistance in nanostructured Tb/Ti and Tb/Si multilayers" @default.
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- W2083148805 doi "https://doi.org/10.1063/1.3544043" @default.
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