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- W2083172519 abstract "Abstract Scale-up of hot-wire CVD reactors for commercial production of a-Si:H based solar cells requires understanding of the large-area deposition process. Therefore, the process was simulated using the Direct Simulation Monte Carlo-method (G.A. Bird, Clarendon Press, Oxford (1994)), considering reactions at the filaments, in the gas phase and at the substrate, and in particular large-area deposition by modeling the gas shower and the filament grid, which were found to determine the uniformity and quality of the a-Si:H films (Thin Solid Films 395 (2001) 61; Solar Energy Mater. Solar Cells 73 (2002) 321). The distance between the filament grid and the substrate ( d fil–S ) and the distance between the filaments ( d fil ) were systematically varied, and the simulation results were compared to experimental results obtained in our large-area deposition system (Thin Solid Films 395 (2001) 61; Solar Energy Mater. Solar Cells 73 (2002) 321). The experimentally obtained optimum filament-to-substrate distance was supported by an optima in the simulated Si 2 H 4 -concentration. For other species, the existence was confirmed but a definite value for optimum d fil–S could not be concluded. The simulations also confirmed the influence of the filament geometry on the uniformity as obtained in the experiments." @default.
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- W2083172519 date "2003-04-01" @default.
- W2083172519 modified "2023-10-14" @default.
- W2083172519 title "Monte Carlo simulations on large-area deposition of amorphous silicon by hot-wire CVD" @default.
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- W2083172519 doi "https://doi.org/10.1016/s0040-6090(03)00075-0" @default.
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