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- W2083308049 abstract "We study by x-ray diffraction (XRD) the structural variations on a series of SnO x :F films grown by dc reactive sputtering from a metallic tin target in an Ar- O 2 -Freon plasma. We found that the films tend to be crystalline when the stoichiometry approaches to that of SnO or SnO 2 , being amorphous in between. We fitted the x-ray diffractograms and found that films are composed by a mixture of compounds, i.e. SnO, Sn 3 O 4 , Sn 2 O 3 and SnO 2 , given by the simultaneous presence of Sn +2 and Sn +4 . From the analysis of the deconvoluted areas under the x-ray diffractograms we calculate the Sn +2 / Sn and Sn +4 / Sn molar fraction present in the films. The same calculations are done for the x-ray photoelectron spectroscopy (XPS) results. By applying a combinatory model we fitted the general behavior of SnO x films with different oxygen content versus the Sn +2 / Sn and Sn +4 / Sn molar fraction. Both XRD and XPS results are compared with the theoretical curve, showing a well agreement." @default.
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- W2083308049 date "2001-08-20" @default.
- W2083308049 modified "2023-10-16" @default.
- W2083308049 title "CHEMICAL COMPOSITION AND CRYSTALLINE PHASES IN F-DOPED TIN OXIDE FILMS GROWN BY DC REACTIVE SPUTTERING" @default.
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- W2083308049 doi "https://doi.org/10.1142/s0217984901002178" @default.
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