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- W2083316897 abstract "We developed alicyclic acrylates with a hydrophilic moiety for use as an ArF chemically amplified positive resist. These monomers have an alicyclic unit, a norbornyl group, and a hydrophilic group, such as a hydroxyl, ester, acetate, or γ-lactone group. The acrylate polymer having a γ-lactone unit, 5-acryloyloxy-6-hydroxynorbornane-2-carboxylic 6-lactone, exhibited high thermal stability and high hydrophilicity. A chemically amplified positive resist composed of a terpolymer using the norbornyl acrylate with a lactone structure and a photoacid generator produced a fine resolution of a 0.12 µm L/S pattern at 16.3 mJ/cm 2 by ArF exposure. This resist also produced a contact hole resolution of 0.14 µm with a depth of focus of 0.5 µm and exhibited good dry-etching resistance. The oxide etching rate achieved when using the developed resist is 1.29 times that of using a novolac resist, and it produces no resist top roughness after etching." @default.
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- W2083316897 date "2001-12-01" @default.
- W2083316897 modified "2023-10-18" @default.
- W2083316897 title "ArF Chemically Amplified Positive Resist Based on Alicyclic Lactone Polymer" @default.
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- W2083316897 doi "https://doi.org/10.1143/jjap.40.7162" @default.
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