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• W2083505366 abstract "A deposition model that considers a mixture of random deposition with surface relaxation and a pure random deposition is proposed and studied. As the system evolves, random deposition with surface relaxation (pure random deposition) take place with probability p and (1-p), respectively. The discrete (microscopic) approach to the model is studied by means of extensive numerical simulations, while continuous equations are used in order to investigate the mesoscopic properties of the model. A dynamic scaling ansatz for the interface width W(L,t,p) as a function of the lattice side L, the time t and p is formulated and tested. Three exponents, which can be linked to the standard growth exponent of random deposition with surface relaxation by means of a scaling relation, are identified. In the continuous limit, the model can be well described by means of a phenomenological stochastic growth equation with a p-dependent effective surface tension." @default.
• W2083505366 created "2016-06-24" @default.
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• W2083505366 date "2001-05-29" @default.
• W2083505366 modified "2023-10-17" @default.
• W2083505366 title "Competitive growth model involving random deposition and random deposition with surface relaxation" @default.
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• W2083505366 doi "https://doi.org/10.1103/physreve.63.066132" @default.
• W2083505366 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/11415198" @default.
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