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• W2083506594 abstract "Convergent beam electron diffraction patterns of silicon from the gate channel region of a complementary metal-oxide-semiconductor transistor with recessed Si(.82)Ge(.18) stressors were analysed using three zone axes: <230>, <340> and <670>. Values measured using these axes were compared with each other with regards to strain along the [110] and the [001] directions. It was demonstrated that strain measurements made using all three axes showed reasonable agreement with each other: an increase in the [110] compressive strain and a switch from compressive to tensile strain in the [001] with decreasing distance below the gate. It was also observed that the strain calculations using the <230> axis had the lowest uncertainty whereas the <670> axis allowed for measurements closest to the gate due to the improved lateral resolution at that tilt angle." @default.
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• W2083506594 date "2010-03-01" @default.
• W2083506594 modified "2023-09-26" @default.
• W2083506594 title "Using a <670> zone axis for convergent beam electron diffraction measurements of lattice strain in strained silicon" @default.
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• W2083506594 doi "https://doi.org/10.1111/j.1365-2818.2010.03364.x" @default.
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