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- W2083683463 abstract "Abstract Two technological strategies to generate patterned diamond growth have been tested. The diamond micro-structures (i.e. linear stripes and 5 µm narrow channels) were grown in the thickness of 450 nm on Si/SiO 2 substrates by a microwave plasma chemical vapor deposition process. Strategy 1, employing a metal mask, resulted in unsatisfying patterned diamond growth due to instability of metal mask. Strategy 2 was based on a direct lithographic patterning of the seeding layer and resulted in a strongly selective, homogenous, and compact growth of diamond on the polymer-coated seeding patterns. This is assigned to the high seeding yield. The diamond micro-structures formed in this way exhibit surface conductivity of 10 − 7 (Ω/□) − 1 as assessed by I – V characteristics. The observed results appear promising for the development of directly grown diamond-based transistors." @default.
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- W2083683463 date "2009-11-01" @default.
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- W2083683463 title "Simplified procedure for patterned growth of nanocrystalline diamond micro-structures" @default.
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- W2083683463 doi "https://doi.org/10.1016/j.tsf.2009.06.014" @default.
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