Matches in SemOpenAlex for { <https://semopenalex.org/work/W2083860033> ?p ?o ?g. }
Showing items 1 to 86 of
86
with 100 items per page.
- W2083860033 abstract "The constant reduction in critical dimensions required for new device generations and the use of sub-wavelength lithography impact the quality of the aerial image transferred into the resist layer. As an example, the intrinsic bias between isolated and dense features in the aerial image is becoming more and more significant, requiring better performance from the resist process to cancel this effect. This work investigates the process mechanisms leading to Iso-Dense bias (I-D bias) reduction for two 193 nm methacrylate based resists at constant optical settings, as a function of PEB temperature. In both cases, it has been possible to find optimized process conditions leading to reduced I-D bias values, but it appears that the leading mechanisms involved during PEB are different and do not seem equivalent in terms of resist capabilities. Reaction controlled resists, which work with a Diffusion Well effect during PEB, that is a high diffusion contrast between exposed and unexposed areas, allow I-D bias compensation without degrading resolution performance. On the contrary, diffusion controlled resists, which usually require high Post Exposure Bake (PEB) temperature to thermally boost the deprotection reaction, do not keep a high diffusion contrast between exposed and unexposed areas during PEB. Consequently, for these resists, best process conditions for I-D bias reduction do not correspond to the optimized process conditions for other resist performance, such as resolution and DOF. In this paper, the two different mechanisms which drives the acid catalyzed deprotection during the Post Exposure Bake step have been studied using different characterization techniques (modulated Temperature DSC, Dielectric analysis, in-situ Ellipsometry) and process performance has been correlated with 193 nm resist component properties (Polymer matrix, protecting groups or PAG characteristics)." @default.
- W2083860033 created "2016-06-24" @default.
- W2083860033 creator A5001580603 @default.
- W2083860033 creator A5014450384 @default.
- W2083860033 creator A5054769453 @default.
- W2083860033 creator A5062194469 @default.
- W2083860033 creator A5088253703 @default.
- W2083860033 date "2000-06-23" @default.
- W2083860033 modified "2023-09-23" @default.
- W2083860033 title "Minimization of the iso-dense bias in chemically amplified 193-nm positive resists: influence and monitoring of the diffusion well" @default.
- W2083860033 doi "https://doi.org/10.1117/12.388352" @default.
- W2083860033 hasPublicationYear "2000" @default.
- W2083860033 type Work @default.
- W2083860033 sameAs 2083860033 @default.
- W2083860033 citedByCount "1" @default.
- W2083860033 crossrefType "proceedings-article" @default.
- W2083860033 hasAuthorship W2083860033A5001580603 @default.
- W2083860033 hasAuthorship W2083860033A5014450384 @default.
- W2083860033 hasAuthorship W2083860033A5054769453 @default.
- W2083860033 hasAuthorship W2083860033A5062194469 @default.
- W2083860033 hasAuthorship W2083860033A5088253703 @default.
- W2083860033 hasConcept C113196181 @default.
- W2083860033 hasConcept C120665830 @default.
- W2083860033 hasConcept C121332964 @default.
- W2083860033 hasConcept C134406635 @default.
- W2083860033 hasConcept C165801399 @default.
- W2083860033 hasConcept C171250308 @default.
- W2083860033 hasConcept C172385210 @default.
- W2083860033 hasConcept C185592680 @default.
- W2083860033 hasConcept C192562407 @default.
- W2083860033 hasConcept C195370968 @default.
- W2083860033 hasConcept C204223013 @default.
- W2083860033 hasConcept C2779227376 @default.
- W2083860033 hasConcept C43617362 @default.
- W2083860033 hasConcept C49040817 @default.
- W2083860033 hasConcept C53524968 @default.
- W2083860033 hasConcept C557185 @default.
- W2083860033 hasConcept C62520636 @default.
- W2083860033 hasConcept C69357855 @default.
- W2083860033 hasConcept C97355855 @default.
- W2083860033 hasConceptScore W2083860033C113196181 @default.
- W2083860033 hasConceptScore W2083860033C120665830 @default.
- W2083860033 hasConceptScore W2083860033C121332964 @default.
- W2083860033 hasConceptScore W2083860033C134406635 @default.
- W2083860033 hasConceptScore W2083860033C165801399 @default.
- W2083860033 hasConceptScore W2083860033C171250308 @default.
- W2083860033 hasConceptScore W2083860033C172385210 @default.
- W2083860033 hasConceptScore W2083860033C185592680 @default.
- W2083860033 hasConceptScore W2083860033C192562407 @default.
- W2083860033 hasConceptScore W2083860033C195370968 @default.
- W2083860033 hasConceptScore W2083860033C204223013 @default.
- W2083860033 hasConceptScore W2083860033C2779227376 @default.
- W2083860033 hasConceptScore W2083860033C43617362 @default.
- W2083860033 hasConceptScore W2083860033C49040817 @default.
- W2083860033 hasConceptScore W2083860033C53524968 @default.
- W2083860033 hasConceptScore W2083860033C557185 @default.
- W2083860033 hasConceptScore W2083860033C62520636 @default.
- W2083860033 hasConceptScore W2083860033C69357855 @default.
- W2083860033 hasConceptScore W2083860033C97355855 @default.
- W2083860033 hasLocation W20838600331 @default.
- W2083860033 hasOpenAccess W2083860033 @default.
- W2083860033 hasPrimaryLocation W20838600331 @default.
- W2083860033 hasRelatedWork W1965371356 @default.
- W2083860033 hasRelatedWork W1972510861 @default.
- W2083860033 hasRelatedWork W2008826099 @default.
- W2083860033 hasRelatedWork W2013369277 @default.
- W2083860033 hasRelatedWork W2017034776 @default.
- W2083860033 hasRelatedWork W2026028626 @default.
- W2083860033 hasRelatedWork W2028564499 @default.
- W2083860033 hasRelatedWork W2028985536 @default.
- W2083860033 hasRelatedWork W2035494385 @default.
- W2083860033 hasRelatedWork W2043009507 @default.
- W2083860033 hasRelatedWork W2045300306 @default.
- W2083860033 hasRelatedWork W2047569315 @default.
- W2083860033 hasRelatedWork W2057356230 @default.
- W2083860033 hasRelatedWork W2060002779 @default.
- W2083860033 hasRelatedWork W2064165724 @default.
- W2083860033 hasRelatedWork W2076968910 @default.
- W2083860033 hasRelatedWork W2089573310 @default.
- W2083860033 hasRelatedWork W2101290116 @default.
- W2083860033 hasRelatedWork W2516179283 @default.
- W2083860033 hasRelatedWork W1967868735 @default.
- W2083860033 isParatext "false" @default.
- W2083860033 isRetracted "false" @default.
- W2083860033 magId "2083860033" @default.
- W2083860033 workType "article" @default.