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- W2083886503 abstract "22Porous silicon (PS) prepared from an n-type Si(100) wafer was utilized as a reducing agent and a nanosubstrate for the reduction of rhodium complex ions [RhCl6]3- from aqueous solution to metallic Rh nanostructures on the surface of the n-type PS. The morphology and the electronic properties of the PS layers as well as the rhodium nanostructures were studied by field emission scanning electron microscopy, X-ray absorption fine structures spectroscopy, and X-ray excited optical luminescence (XEOL). The average particle size of Rh nanostructures on PS was estimated to be ∼7 nm by the X-ray diffraction pattern. The specificity of XEOL allowed for the investigation of the effect of Rh nanostructures on the optical properties of PS." @default.
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- W2083886503 date "2004-04-27" @default.
- W2083886503 modified "2023-09-26" @default.
- W2083886503 title "Reductive Deposition of Rh Nanostructures on n-Type Porous Silicon: X-ray Absorption and X-ray Excited Optical Luminescence Studies" @default.
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- W2083886503 doi "https://doi.org/10.1021/la049884g" @default.
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