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- W2084126872 abstract "Annealing and chemical mechanical polishing is used to fabricate a Ge2Sb2Te5 phase change memory (PCM) cell with a protruding bottom electrode (PBE) structure. Compared to the conventional flat BE structure, the set and reset voltage values of the PBE cell are reduced from 2.3 to 1.2 V and from 3.5 to 2.2 V, respectively. The cell endurance is enhanced from 7.5 × 105 to 8.5 × 106. The power consumption problem and cycle endurance issue of the PCM device have been solved." @default.
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- W2084126872 date "2009-06-01" @default.
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- W2084126872 title "The effect of annealing and chemical mechanical polishing on Ge2Sb2Te5 phase change memory" @default.
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- W2084126872 doi "https://doi.org/10.1016/j.scriptamat.2009.02.023" @default.
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